Pressurized Joule Heating Device XN-PJH
SKU: XN-PJH
Pressurized Joule Heating Device XN-PJH combines rapid Joule heating with controlled uniaxial or bidirectional pressure for material treatment up to 2650 °C and 100 MPa. Vacuum, inert-gas, and compatible reactive-gas configurations are available.
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Name: Pressurized Joule Heating Device
Equipment Type: Pressurized Joule Heating Device
Product Code: XN-PJH
Brand: Xnergy
Product Introduction:
The XN-PJH combines high-current Joule heating with a controllable pressure environment for rapid high-temperature and high-pressure processing. It supports sample temperatures up to 2650 °C and pressures up to 100 MPa, making it suitable for advanced-material synthesis, high-temperature/high-pressure research, and high-performance sample preparation.
The system offers programmable HMI control, real-time temperature and pressure monitoring, water cooling, vacuum or controlled-atmosphere operation, and configurable pressure, chamber, window, and sample-fixture options.
Key Features:
Maximum sample temperature of 2650 °C
Maximum pressure of 100 MPa
Rapid heating up to 1500 °C/min
Uniaxial or bidirectional pressurization
Vacuum, inert-gas, or compatible reactive-gas operation
Infrared non-contact temperature measurement
Real-time temperature and pressure acquisition
One-button automated process control
Overcurrent protection and emergency stop
Technical Specifications:
| Parameter | Specification |
|---|---|
| Model | XN-PJH |
| Rated Power | 60 kW; customizable |
| Maximum Sample Temperature | 2650 °C |
| Maximum Pressure | 100 MPa |
| Pressure Options | 0.1 T, 3 T, 5 T, or 10 T; customizable |
| Vacuum Level | 6 × 10⁻² Pa; molecular-pump option available |
| Temperature Measurement | Infrared non-contact; accuracy ±1% |
| Vacuum Chamber | SS304; optional SS316 |
| Sample Diameter | 50, 40, 30, 20, or 10 mm; customizable |
| Sample Thickness | ≤10 mm |
| Electrode Material | Graphite |
| Observation Window | Quartz; optional sapphire |
| Enclosure | Sheet-metal construction |
| Working Atmosphere | Vacuum, inert gas, or compatible reactive gas |
| Gas Connections | Two inlet ports, one exhaust port, and one vacuum port |
| Operation | HMI touchscreen with centralized data collection and processing |
| Data Acquisition | Real-time temperature and pressure monitoring |
| Maximum Heating Rate | 1500 °C/min with cylindrical graphite heating element; 1000 °C/min with graphite plate |
| Pressurization | Uniaxial or bidirectional; customizable |
| Cooling Method | Water cooling |
| Automation | One-button startup and automated process control; robotic handling available as a customization |
| Power Supply | Configured according to applicable local electrical standards; facility capacity of at least 60 kW is required |
| Safety | Overcurrent protection and emergency-stop button |
Applications:
Superhard materials such as nano-polycrystalline diamond and cubic boron nitride
Semiconductor materials including gallium arsenide and silicon carbide
Lithium-battery electrode and solid-electrolyte materials
Ceramics, metals, and composite materials
Refractory metals
High-temperature/high-pressure material synthesis
Suitable Samples:
Films, powders, and bulk samples within the selected fixture dimensions.
Note: Pressure, chamber material, observation window, sample diameter, atmosphere, and automation can be configured for the application. Related equipment includes the High-Throughput Joule Heating Device XN-HTG, Flash Joule Heating Device XN-FJH-400V, Joule Quenching Heating Device XN-HTL-1532E, Joule Ultrafast Heating System XN-HTS Series, and Lab Scale 15-Ton Manual Hydraulic Pellet Press.
