Plasma Heating Device XN-PLA
SKU: XN-PLA
Plasma Heating Device XN-PLA generates a stable DC non-transferred plasma arc for ultrahigh-temperature synthesis and treatment. It offers 0–10 kW adjustable power, temperatures from 800–8000 °C, multiple process gases, and PLC/HMI control.
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Name: Plasma Heating Device
Equipment Type: DC Non-Transferred Plasma Heating Device
Product Code: XN-PLA
Brand: Xnergy
Product Introduction:
The XN-PLA uses a DC non-transferred arc formed between graphite electrodes in an inert or compatible process gas. Electrical energy ionizes the gas to produce a high-temperature, chemically active plasma jet that can serve as a controlled heat source for synthesis, spheroidization, coating, melting, reduction, and plasma-chemical research.
The system integrates constant-current or constant-voltage DC power, gas delivery, closed-loop water cooling, PLC/HMI control, high-speed data acquisition, and multiple safety interlocks.
Key Features:
Adjustable 0–10 kW plasma power
800–8000 °C arc-core temperature range
Heating rate of ≥1000 °C per 100 ms
DC non-transferred plasma arc
Argon, nitrogen, helium, or compatible mixed-gas operation
100 Hz to 10 kHz adjustable data acquisition
Constant-current and constant-voltage modes
PLC/HMI process control and fault alarms
Closed-loop water cooling with flow, pressure, and temperature protection
Technical Specifications:
| Parameter | Specification |
|---|---|
| Model | XN-PLA |
| Rated Power | 0–10 kW |
| Maximum Operating Current | 100 A; customizable |
| Temperature Range | 800–8000 °C at the arc core |
| Heating Rate | Adjustable to ≥1000 °C per 100 ms |
| Plasma Type | DC non-transferred arc |
| Process Gases | Argon, nitrogen, helium, or compatible mixed gases |
| Gas Connections | Reserved gas piping, valves, and connectors |
| Cooling System | Closed-loop water cooling with flow, pressure, and temperature monitoring and protection |
| Power System | DC power supply with constant-current and constant-voltage modes, overcurrent protection, and overvoltage protection |
| Stable DC Output | 100 V / 100 A |
| Control System | PLC and HMI for parameter settings, process monitoring, data recording, and fault alarms |
| Control Modes | Manual and automatic |
| Data Acquisition | Temperature, voltage, and current; adjustable from 100 Hz to 10 kHz |
| Communication | RS485 and analog interface |
| Safety Interlocks | Water-pressure, water-temperature, flow, gas-pressure, power-overload, and emergency-stop protection |
| Equipment Dimensions | 1000 × 500 × 600 mm |
| Gas Velocity | 0.2–2 m/s; adjustable |
| Power Stability | ≤±0.5% in DC mode |
| Continuous Operation | 20–200 h, depending on electrode wear |
| Cooling Method | Water cooling |
| Net Weight | 30 kg |
| Power Supply | Configured according to applicable local electrical standards |
| Safety | Overcurrent protection and emergency-stop button |
Applications:
High-temperature ceramic synthesis, including carbides, borides, and oxides
Metal nanopowders, carbon nanotubes, and high-purity spherical powders
Plasma spheroidization and surface coating
Material melting and reduction
Plasma-chemical reactions and catalyst synthesis
Solid-phase reactions and VOC decomposition research
Note: Gas type, power, flow, electrode configuration, and process-control functions can be adapted to project requirements. Related equipment includes the Joule Ultrafast Heating Quenching Device XN-JQT, Pressurized Joule Heating Device XN-PJH, High-Throughput Joule Heating Device XN-HTG, Flash Joule Heating Device XN-FJH-400V, and Joule Ultrafast Heating System XN-HTS Series.
